SGE BPX1-SimD


Features dimensionally stabilized phase, very high temperature and extremely low bleed. Replaces DB-HT Sim Dis, DB-2887 and Rtx-2887. Application areas: ASTM Method D2887, extended methods and new High Temperature Simulated Distillation (HTSD) method. Operating temperatures: 430°C+ (Al Clad) (0.1 µm film), 400°C (Polyimide Clad) (0.9 µm film) and 370°C (Polyimide Clad) (2.65 µm film). The substitution into the phase backbone of a benzene molecule (BPX) means the column is protected from temperature and chemical degradation (bleed) over time.
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 482.58295.E1   SGE BPX1-SimD - 10M X 0.1Mm Id - Fast Bpx1 0.1Um - 54777 54777 $1,307.26
 482.58231.E1   SGE BPX1-SimD - Bpx1 0.1m; Capillary Gc Column 10M X 0.53Mm Id - - 54803 54803 $1,065.19
 482.58225.E1   SGE BPX1-SimD - Bpx1- Simd, 10M X 0.53Mm Id X 2.65 m Film - 54802   $1,065.19
 482.58222.E1   SGE BPX1-SimD - Bpx1-Simd 10M X 0.53Mm Id X0.9 m Film Thickness - 54801 54801 $1,065.19
 482.58229.E1   SGE BPX1-SimD - Bpx1-Simd 5M X 0.53Mm Id X 0.1 m Film Thickness - 54800   $1,258.89
 482.58238.E1   SGE BPX1-SimD - Bpx1-Simd ; 2.65m Capillary Gc Column 6M X 0.53Mm Id- - 548025 548025 $1,065.19
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